Incremental monitoring of thin films

Details Incremental monitoring of thin films Incremental monitoring of thin films

1986-12-08

1987-11-17

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

250571, 356382, G01B 1102

Patent

active

047076119

ABSTRACT:
The thickness t and refractive index n of an incremental thin film layer deposited on a base stack of layers are determined, where the characteristic matrix M of the base stack is ##EQU1## by directing light at a first wavelength toward the layer and the base stack, measuring the reflectance of the first wavelength light from the layer and the base stack, directing light at a second wavelength toward the layer and the base stack, and measuring the reflectance of the second wavelength light from the layer and the base stack. The measured values of reflectance for each wavelength are then substituted in the relationship ##EQU2## where

REFERENCES:
patent: 3896211 (1975-03-01), Watanab et al.
patent: 4453828 (1984-06-01), Hershel et al.
Berning, Use of Equivalent Films in Design of Infrared Multilayer Antireflection Coatings, Journal of Optical Society of America, vol. 52, p. 431 (1962).
Budde, Photoelectric Analysis of Polarized Light, Applied Optics, vol. 1, p. 201 (1962).
Dobrowolski, Completely Automatic Synthesis of Optical Thin Film Systems, Applied Optics, vol. 4, p. 937 (1965).
Epstein, The Design of Optical Filters, Journal of the Optical Society of America, vol. 42, p. 806 (1952).
Hauge, et al., Design and Operation of ETA, an Automated Ellipsometer, IBM Journal of Research & Development, p. 472 (Nov. 1973).
Hottier, et al., In Situ Monitoring by Ellipsometry of Metalorganic Epitaxy of GaAlAs-GaAs Superlattice, J. Applied Physics, vol. 51, p. 1599 (1980).
Minot, Single-Layer, Gradient Refractive Index Antireflection Films Effective from 0.35 to 2.5.mu., J. of Optical Society of America, V. 66, p. 515 (1976).
Netterfield, et al., Characterization of Growing Thin Films by in situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy, Review of Scientific Instruments, vol. 56, p. 1995 (1985).
Snedaker, New Numerical Thin-Film Synthesis Technique, Journal of the Optical Society of America, vol. 72, p. 1732 (1982).
Southwell, Quintic Refractive Index Profile Antireflection Coatings, U.S. Pat. No. 4,583,822.
Southwell, Gradient-Index Antireflection Coatings, Optics Letters, vol. 8, p. 584 (1983).
Southwell, Coating Design Using Very Thin High- and Low-Index Layers, Applied Optics, vol. 24 (1985).
Theeten, Ellipsometric Assessment of (Ga,Al) As/GaAs Epitaxial Layers During their Growth in an Organometallic VPE System, Journal of Crystal Growth, vol. 46, p. 245 (1979).
Yadava, Optical Behavior of Gradient-Index Multilayer Films, Thin Solid Films, vol. 21, p. 297 (1974).

Affiliated with

Also associated with

Rating

Incremental monitoring of thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Incremental monitoring of thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Incremental monitoring of thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1451468