Siloxane-amide block copolymer and process for producing the sam

Details Siloxane-amide block copolymer and process for producing the sam Siloxane-amide block copolymer and process for producing the sam

1988-08-05

1989-11-21

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525430, 528 26, 528 28, 522 99, C08F28304

Patent

active

048823961

ABSTRACT:
A siloxane-amide block copolymer having an alkenyl group or a photopolymerizable organic group at both terminals thereof which is represented by formula (I): ##STR1## wherein R.sup.1 represents a reaction residual group of an epoxy compound containing an alkenyl group or a photopolymerizable organic group and/or a substitution reaction product between said reaction residual group and an organosilyl group and the other symbols are as defined in the specification. The copolymer is produced by reacting a polycondensate of a diaminosiloxane and a dicarboxylic acid dihalide with a compound containing an alkenyl group or a photopolymerizable organic group at one terminal thereof and an epoxy group at the other terminal thereof. The siloxane-amide block copolymer exhibits excellent processability and reactive curability by application of heat, light or radiation.

REFERENCES:
patent: 4168360 (1979-09-01), D'Alelio
patent: 4278786 (1981-07-01), Nanaumi et al.

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