Apparatus for cleaning rinsing and drying substrates

Details Apparatus for cleaning rinsing and drying substrates Apparatus for cleaning rinsing and drying substrates

1987-04-24

1988-04-12

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 79, 134 83, 134134, 134135, 134147, 134165, 134184, B08B 312

Patent

active

047367598

ABSTRACT:
Apparatus and a method for cleaning, rinsing and drying substrates, such as semiconductor wafers. The apparatus has a cleaning tank in which one or more megasonic transducers are located, the transducers being adapted to direct megasonic energy past the substrates for cleaning the same. The substrates are held in the cleaning tank by an improved holder which can be pivoted from one side to the other to present opposite side margins of the substrates to the megasonic energy field when otherwise such opposite side margins would not be exposed to such energy field due to the blocking action of parts of the holder. A rinse tank for containing a rinse solution is adjacent to the cleaning tank, and a robotic transfer arm mechanism moves the substrates in the holder from the cleaning tank to the rinse tank for immersion of the substrates into the rinse solution which can be heated to an elevated temperature or can be at ambient temperature. By removing the substrates from the rinse solution at a slow, controlled rate by the robotic arm mechanism, the substrates can emerge from the rinse solution in a dry state to thereby avoid the need for a dryer independent of the rinse tank.

REFERENCES:
patent: 519091 (1894-05-01), Noble
patent: 2985003 (1961-05-01), Gelfand et al.
patent: 3050422 (1962-08-01), Zak
patent: 3893869 (1975-07-01), Mayer et al.
patent: 3896829 (1975-07-01), Sabatka
patent: 3966408 (1976-06-01), Drennen et al.
patent: 4112452 (1978-09-01), Patton
patent: 4252430 (1981-02-01), Michal
patent: 4543130 (1985-09-01), Shwartzman

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