Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-10-29
1998-12-29
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, G03F 7023
Patent
active
058539484
ABSTRACT:
A positive photoresist composition comprising (A) an alkali-soluble resin; (B) a quinonediazido group containing compound; and (C) at least one sulfonyl halide represented by the following general formula (I):
REFERENCES:
patent: 4424270 (1984-01-01), Erdmann et al.
patent: 5229254 (1993-07-01), Lohaus et al.
Doi Kousuke
Kohara Hidekatsu
Mizuta Junichi
Nakayama Toshimasa
Sawano Atsushi
Chu John S.
Tokyo Ohka Kogyo Co. Ltd.
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