Thermal disproportionation of arylhalosilanes

Details Thermal disproportionation of arylhalosilanes Thermal disproportionation of arylhalosilanes

1991-10-24

1992-05-05

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C07F 708

Patent

active

051109743

ABSTRACT:
The present invention is a process for the thermal disproportionation of arylhalosilanes containing at least one hydrogen bonded to silicon. The process involves heating the arylhalosilanes in liquid phase to a temperature within a range of about 250.degree. C. to 450.degree. C. The present process is particularly useful for the disproportionation of phenyldihalosilanes to diphenyldihalosilanes.

REFERENCES:
patent: 2611775 (1952-09-01), Barry
patent: 2730540 (1956-01-01), Sauer
patent: 2746981 (1956-05-01), Wagner
patent: 3637780 (1972-01-01), Bazouin et al.,
patent: 3655710 (1972-04-01), Bazouin et al.
patent: 4746752 (1988-05-01), Lepage et al.
Eaborn et al.; The Interaction of Aryl-Silicon Compounds and Substituted Silyl Radicals J. Organometal. Chem 4:489 (1965).
Gilman et al.; Disproportionation Reaction of Diphenylsilane in the Absence of any Added Catalyst J. Org. Chem. 23:326-328 (1958).

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