Method of nanometer lithography

Details Method of nanometer lithography Method of nanometer lithography

1990-09-28

1992-05-05

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 44, 437 39, 437201, 437913, 148DIG105, 148DIG111, H01L 2144

Patent

active

051107600

ABSTRACT:
Nanometer thick vertical metallic structures are fabricated on a substrate by depositing a metallic layer on a substrate surface on which one or more buttresses are formed, etching the metallic layer to expose the horizontal surfaces of the substrate and the buttresses, and etching the substrate to remove the buttresses, thereby producing vertical structures on the substrate. The metallic layer is formed by thermal decomposition of a volatile metal-containing precursor gas in the presence of a carrier gas at low pressure, unlike that in conventional CVD reactors. The metallic layer thus formed has a grain size which is fraction of the thickness of the vertical structure.

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