Semiconductor wafer carrier design

Details Semiconductor wafer carrier design Semiconductor wafer carrier design

1988-12-20

1991-08-27

Hoag, Willard

Coating apparatus

Work holders, or handling devices

B05C 102

Patent

active

050424238

ABSTRACT:
A carrier for use in a continuous chemical vapor deposition reactor system has a lid with tapered edges which match the sides of a recess in the carrier in which the lid resides during processing of the semiconductor to provide a precise fit for the lid and to minimize thermal stresses in the carrier, the lid and the lid-carrier assembly due to extreme heat during processing of the semiconductor wafer.

REFERENCES:
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4048955 (1977-09-01), Anderson
patent: 4081313 (1976-11-01), McNeilly et al.
patent: 4282924 (1981-08-01), Fareta
patent: 4323031 (1982-04-01), Kaplan
patent: 4395820 (1983-08-01), Sams
patent: 4473455 (1984-09-01), Dean et al.
patent: 4528747 (1985-07-01), Hoffman et al.
patent: 4534314 (1985-08-01), Ackley
patent: 4589369 (1986-05-01), Mahler
patent: 4595481 (1986-06-01), Allen et al.
patent: 4634512 (1987-01-01), Allen et al.
patent: 4650064 (1987-03-01), Sladaugh
patent: 4693201 (1978-06-01), Dietze et al.
patent: 4759488 (1988-07-01), Robinson et al.
patent: 4767984 (1988-08-01), Bakker

Affiliated with

Also associated with

Rating

Semiconductor wafer carrier design does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor wafer carrier design, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor wafer carrier design will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1407536