Process for providing a landless via connection

Metal working – Method of mechanical manufacture – Electrical device making

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174262, 427 96, H05K 336

Patent

active

054956650

ABSTRACT:
A process for connecting at least two electrically conductive patterns through a dielectric material by a landless electrical connection is provided. The process includes providing a composite containing a dielectric substrate having a conductive plane on at least one of its major surfaces and a temporary support layer covering the conductive plane. Blind vias are provided in the dielectric substrate and are plated with an electrically conductive material. The temporary support layer is removed thereby providing a landless electrical connection through the dielectric material and the conductive plane is available for providing external electrical conductive pattern.

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Chumbres et al., Landless Plated-Through Hole Photoresist Masking Process, IBM Technical Disclosure Bulletin, vol. 15, No. 10, Mar. 1973, pp. 3298-3299.
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