Process for production of a resistance element for resistance th

Details Process for production of a resistance element for resistance th Process for production of a resistance element for resistance th

1976-12-16

1978-02-07

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

338308, C23C 1500

Patent

active

040725936

ABSTRACT:
There is provided a process of producing a resistance element for a resistance thermometer consisting of a thin platinum layer on an insulating solid as a carrier, by sputtering the platinum layer on the solid in a krypton-oxygen or xenon-oxygen mixture.

REFERENCES:
patent: 3645783 (1972-02-01), Rupert et al.
patent: 3833410 (1974-09-01), Ang
patent: 3845443 (1974-10-01), Fisher
W. D. Westwood et al. "Formation of PtO Films by Reactive Sputtering, " J. Appl. Phys. 45, pp. 2313-2315 (1974).
C. D. Bennewitz et al. "Structural & Electrical Properties of Films Sputtered from a Pt Cathode in Argon-Oxygen Mixtures," J. Appl. Phys., 46, pp. 558-567 (1975).

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