Fishing – trapping – and vermin destroying
Patent
1996-06-21
1998-06-23
Dang, Trung
Fishing, trapping, and vermin destroying
437974, 216 2, 216 79, H01L 2176
Patent
active
057704651
ABSTRACT:
A process is described for manufacturing submicron, ultra-high aspect ratio microstructures using a trench-filling etch masking technique. Deep trenches are etched into a substrate, the trenches are filled with an appropriate trench-filling material, and deep etching into the substrate is carried out with the trench-filling material serving as a mask.
REFERENCES:
patent: 4968585 (1990-11-01), Albrecht et al.
patent: 5256592 (1993-10-01), Matsushita
patent: 5273939 (1993-12-01), Becker
patent: 5296092 (1994-03-01), Kim
patent: 5306659 (1994-04-01), Beyer
patent: 5316979 (1994-05-01), MacDonald
patent: 5324683 (1994-06-01), Fitch
patent: 5372968 (1994-12-01), Lur
patent: 5393375 (1995-02-01), MacDonald
patent: 5407860 (1995-04-01), Stoltz
Chen Liang-Yuh
Huang Xiaojun Trent
MacDonald Noel C.
Cornell Research Foundation Inc.
Dang Trung
LandOfFree
Trench-filling etch-masking microfabrication technique does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Trench-filling etch-masking microfabrication technique, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Trench-filling etch-masking microfabrication technique will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1393881