Positive type photosensitive resin composition with at least two

Details Positive type photosensitive resin composition with at least two Positive type photosensitive resin composition with at least two

1983-04-12

1985-02-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430193, 430311, 430326, 430331, 534561, G03C 160, G03F 726

Patent

active

044991711

ABSTRACT:
A positive type photosensitive resin composition comprising an alkali-soluble novolac resin and (A) a compound represented by the following general formula (I) and a compound represented by the following general formula (II) or (B) a compound represented by the following general formula (III) and a compound represented by the following general formula (IV), wherein the molar ratio of the compound represented by the general formula (I) to the compound represented by the general formula (II) is 6/4-9/1 or the molar ratio of the compound represented by the general formula (III) to the compound represented by the general formula (IV) is 1/9-9/1 and the total amount of the component (A) or (B) is 5-100 parts by weight per 100 parts by weight of the alkali-soluble novolac resin: ##STR1## wherein R.sub.1, R.sub.5, R.sub.8 and R.sub.10, which may be identical or different, represent alkyl groups, aryl groups or aralkyl groups; and R.sub.2, R.sub.3, R.sub.4, R.sub.6, R.sub.7, R.sub.9, R.sub.11 and R.sub.12, which may be identical or different, represent 1,2-naphthoquinonediazide-4-sulfonyl groups, 1,2-naphthoquinonediazide-5-sulfonyl groups or 1,2-benzoquinonediazide-4-sulfonyl groups. Said positive type photosensitive resin composition is excellent in both sensitivity and yield of residual film thickness.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3180733 (1965-04-01), Neugebauer et al.
patent: 3402044 (1968-09-01), Steinhoff et al.
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4059449 (1977-11-01), Rosenkranz et al.
patent: 4189320 (1980-02-01), Hsieh
Dinaburg, M. S., "Photosensitive Diazo Cpds", The Focal Press, 1964, pp. 182-191.

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