Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1983-06-24
1985-02-12
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430396, 428203, 428209, 427164, 427165, G03F 900, G03C 506
Patent
active
044991622
ABSTRACT:
A photomask (60) used to form patterns on a resist coated semiconductor wafer is comprised of a light transmissive baseplate (62) having a thin metallic pattern (63) thereon; a plasma deposited coating (66) covering the patterned baseplate (62); a light transmissive, planar coverplate (68) in intimate contact with the coating (66) with an index matching fluid (72) interposed therebetween.
REFERENCES:
patent: 4063812 (1977-12-01), Abraham et al.
patent: 4178404 (1979-12-01), Allen et al.
patent: 4361643 (1982-11-01), Banks et al.
patent: 4390273 (1983-06-01), Loebach et al.
Banks Edward L.
Ellington, IV Thomas S.
Kuyel Birol
AT&T - Technologies, Inc.
Dees Jos,e G.
Kirk D. J.
Kittle John E.
Levy R. B.
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