Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Patent
1995-06-07
1997-01-14
Chu, John S. Y.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
526293, 526313, C08F 2240
Patent
active
055940862
ABSTRACT:
A compound, method of manufacture and method for use of an alternating copolymer having the structure ##STR1## wherein X is independently H, C.sub.1 to C.sub.10 alkyl or alkoxy, primary or secondary amino or halogen, and R is aliphatic, cycloaliphatic, or aliphatic heterocyclic, and wherein the molecular weight ranges from about 1,000 to 50,000.
REFERENCES:
patent: 2276138 (1942-03-01), Alderman
patent: 3963662 (1976-06-01), Fujiwara et al.
patent: 3964908 (1976-06-01), Bargon et al.
patent: 3970534 (1976-07-01), Fujiwara et al.
patent: 4100140 (1978-07-01), Zahir et al.
patent: 4144063 (1979-03-01), Haas
patent: 4221700 (1980-09-01), Minagawa et al.
patent: 4298720 (1981-11-01), Yamazaki et al.
patent: 4388451 (1983-06-01), Culbertson et al.
patent: 4451676 (1984-05-01), Everly
patent: 4544704 (1985-10-01), Hefner, Jr.
patent: 4565846 (1986-01-01), Saito et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4600683 (1986-07-01), Greco et al.
patent: 4661574 (1987-04-01), Younes
patent: 4663268 (1987-05-01), Turner et al.
patent: 4684597 (1987-08-01), Lussier
patent: 4684692 (1987-08-01), Younes
patent: 4931381 (1990-06-01), Spak et al.
Jones, J. A. and Ottenbrite, R. M.; Journal of Polymer Chemistry vol. 24, pp. 1487-1595 (1986)--"Preparation and Structural Characterization of Poly(4-vinylphenylacetate-co-maleic anhydride".
Corson, B. B., et al; Apr. 1958; Preparation of Vinylphenols and Isopropenylphenols.
Arshady, R. and Kenner, G. W., Journal of Polymer Science vol. 12, (pp. 2017-2025) 1974; "Phenolic Resins for Solid-Phase Synthesis:Copolymerization of Styrene and p-acetoxystyrene".
Packham, D. I.; 1964; "Chelating Polymers Derived from Poly(4-hydroxystyrene)".
Turner, S. R. et al; Polymer Engineering and Science, Sep. 1986 "High-Tg Base Soluble Copolymers as Novolac Replacements for Positive Photoresists".
Turner, S. R. et al "Thermally Stable, Deep U.V. Resist Material".
Jones, J. A. et al., Journal of Polymer Chemistry, vol. 24, pp. 1487-1595, 1986.
Corson, B. B. et al., "Preparation of vinylphenols and Isopropenylphenols", Apr. 1958.
Arshady, R. et al., Journal of Polymer Science, vol. 12, 1974, pp. 2017-2025.
Packham, D. I., "Chelating Polymers Derived for Poly(4-hydroxystrenes)," 1964.
Turner, S. R., et al, Polymer Eng. & Science, "High-Tg Base Soluble Copolymers as Novolac Replacements for Positive Photoresists", Sep. 1986 pp. 1096-1100.
Turner, S. R. et al., Polymer Matl Sci & Eng, "Thermally Stable Deep UV Resist Materials", 1986, pp. 608-610.
Chu John S. Y.
Hoechst Colanese Corp
McGinnis James L.
LandOfFree
Preparation and use of poly(3,5 disubstituted-4-hydroxystyrene/n does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Preparation and use of poly(3,5 disubstituted-4-hydroxystyrene/n, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Preparation and use of poly(3,5 disubstituted-4-hydroxystyrene/n will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1389015