Method and means for interferometric surface topography

Details Method and means for interferometric surface topography Method and means for interferometric surface topography

1982-05-03

1985-02-12

Willis, Davis L.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356359, G01B 902

Patent

active

044987714

ABSTRACT:
For the point-by-point interferometric measuring of surfaces which are scanned along lines, or which are subjected to a processing procedure (e.g. etching) a focused laser beam is directed with oblique incidence as a measuring beam onto the respective measured points. The respective height of a measured point determines the path difference (phase difference) between the measuring beam and a reference beam which has been suitably split off the input beam. The oblique incidence (angle of incidence .gtorsim.80.degree.) makes it possible to measure interferometrically very rough surfaces. The measuring range may be extended if the reference beam is directed at an oblique angle of incidence, differing only slightly from that of the measuring beam onto the surface to be examined.

REFERENCES:
patent: 3623813 (1971-11-01), Hacman
patent: 3849003 (1974-11-01), Velzel
patent: 3958884 (1976-05-01), Smith
patent: 4298283 (1981-11-01), Makosch et al.
patent: 4358201 (1982-11-01), Makosch
Sawatari, "Surface Flaw Detection Using Oblique Angle Illumination", Applied Optics, vol. 11, No. 6, pp. 1337-1344, Jun. 1972.

Affiliated with

Also associated with

Rating

Method and means for interferometric surface topography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and means for interferometric surface topography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and means for interferometric surface topography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1387054