Photographic light-sensitive silver halide material containing a

Details Photographic light-sensitive silver halide material containing a Photographic light-sensitive silver halide material containing a

1988-11-14

1990-01-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430528, 430529, 430631, 430634, G03C 182

Patent

active

048913065

ABSTRACT:
A static-inhibited photographic light-sensitive material is provided by incorporating a fluorine-containing block polymer derived from a polymerizable hydrophobic monomer containing at least one fluorine atom and a polymerizable hydrophilic monomer, as an antistatic agent in at least one layer thereof. Unlike known antistatic agents and methods, the use of the above antistatic agent does not adversely affect the photographic characteristics, antitack property, marring resistance, etc., of the photographic light-sensitive material.

REFERENCES:
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patent: 4266915 (1981-05-01), Butler et al.
patent: 4362812 (1982-12-01), Minamizono et al.
patent: 4495275 (1985-01-01), Yokoyama et al.
I. Skiest, "Copolymerization: The Composition Distribution Curve," J. Am. Chem. Soc'y., vol. 68, (1946), pp. 1781-1784.
V. E. Meyer et al, "Integral and Differential Binary Copolymerization Equations," J. Polym. Sci., vol. A3, (1965), pp. 2843-2851.
V. E. Meyer et al, "Computer Calculations of Batch-Type, Etc.," Polymer Preprints, vol. 8(1), (1967), pp. 209-215.
B. Vollmert, Polymer Chemistry, Ch. 4: "Synthesis of Macromolecules with C-C Chains", (1973), pp. 115-127.
A. Noshay et al, Block Copolymers, Ch. 3: "Block Copolymer Architecture", (1977), pp. 24-29.

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