Thin film forming device

Details Thin film forming device Thin film forming device

1987-07-14

1990-01-02

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

With treating means

118 501, C23C 1648

Patent

active

048905755

ABSTRACT:
A thin film forming device comprises a vacuum tank held at the predetermined degree of vaccum; a substrate placed in the vacuum tank; internal tanks disposed in the vacuum tank and each having an opening opposite to the substrate; gas jet nozzles, one arranged in each of the internal tanks and connected with reactive gas sources outside the vacuum tank, for jetting reactive gases of different types toward the substrate through the openings of the internal tanks; and electron beam irradiation devices disposed close to a passage, through which the reactive gases jetted from the gas jet nozzles pass, for irradiating electron beams to the reactive gases.

REFERENCES:
patent: 4147573 (1979-04-01), Morimoto
patent: 4161418 (1979-07-01), Morimoto
patent: 4645977 (1987-02-01), Kurokawa et al.
European Search Report, Application No. EP 87110160.6, Nov. 24, 1987.
Patent Abstracts of Japan, Unexamined Applications, C Field, vol. 9, No. 66, Mar. 26, 1985, The Patent Office Japanese Government, p. 157, 271, Abstract of Kokai-No. 59-200753.

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