Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1995-06-22
1998-03-10
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427 58, 427314, 427427, 437225, C23C 1412
Patent
active
057259127
ABSTRACT:
A method of manufacturing an electric heating film of semiconductor including steps of fusing together halides of indium or tin or their organic compound and adding 1-10% of impurities of halides of antimony or iron, hydrogen fluoric acid, or ammonium fluoride in weight, mixing and stirring well the materials with a medium material at a proportion of 20-60% in weight, and cleaning a base material with clean soft water and drying the surface thereof, and disposing the base material into a heating furnace for activating its surface, mixing the liquid material with air and spraying it into the heating furnace thereby atomizing and dissolving the liquid material into ions, and letting the ions be accumulated and evenly coated on the surface of the base material or directly spraying the liquid material on the activated surface of the base material thereby forming an electric heating film of semiconductor on the base material.
REFERENCES:
patent: 2564709 (1951-08-01), Mochel
patent: 3108019 (1963-10-01), Davis
patent: 4889974 (1989-12-01), Auding et al.
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