Method of making a floating gate memory device

Fishing – trapping – and vermin destroying

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437 48, 437 52, H01L 218247, H01L 218239

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054728932

ABSTRACT:
Provided is a semiconductor memory device wherein nonvolatile memory elements are arranged in a matrix configuration, each of the memory elements having a field effect transistor including a floating gate, an interlayer insulating film and a control gate electrode which are stacked on an insulating film covering a semiconductor substrate, and a source region and a drain region which are respectively formed in the semiconductor substrate on both sides of the gate electrode, the floating gate, interlayer insulating film and control gate electrode being formed in a recess provided in the semiconductor substrate. The semiconductor device of such a structure is reduced in size and highly integrated with its high-performance characteristics maintained.

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IBM Technical Disclosure Bulletin vol. 25 No. 4 Sep. 1982.

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