Method of making a semiconductor photoelectric conversion device

Fishing – trapping – and vermin destroying

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437 4, 437174, 437233, 437942, 437967, 136258, H01L 2126

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054787777

ABSTRACT:
A method for forming a semiconductor material involves forming an i-type non-single crystalline layer on a substrate and crystallizing the semiconductor material by irradiation with a light having a wavelength in the range of 250 to 600 nm. Desirably, the crystals of the semiconductor material extend in column form approximately perpendicular to the substrate. Preferably, the i-type layer is doped with a recombination center neutralizer selected from hydrogen and a halogen element and the concentration of impurities forming recombination centers, such as oxygen, nitrogen, carbon, phosphorus and boron, are maintained at 1 atomic % or less.

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Article by Charles Magee and David E. Carlson entitled "Investigation of the Hydrogen and Impurity Contents of Amorphous Silicon by Secondary Ion Mass Spectrometer" dated Jan., 1980.

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