Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1997-06-25
1999-06-29
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134 76, 134902, 414222, B08B 302
Patent
active
059153962
ABSTRACT:
A substrate processing apparatus is provided which requires a reduced installation space and allows for ready change of a process order. A substrate processing apparatus includes: a first transportation mechanism movable along a first transportation path in a predetermined transportation direction; a cassette load portion provided on one side of the transportation path; a plurality of unit portions arranged in a direction crossing the transportation direction on the other side of the first transportation path; and a second transportation mechanism disposed between each two adjacent unit portions and movable along a second transportation path in the transportation direction. The first transportation mechanism can perform a substrate transferring operation with respect to a cassette placed on the cassette load portion and a processing unit in a unit portion disposed in closest proximity to the first transportation path among the plurality of unit portions. The second transportation mechanism can perform a substrate transferring operation with respect to any processing units included in unit portions disposed on opposite sides of the second transportation path.
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patent: 5578127 (1996-11-01), Kimura
patent: 5603777 (1997-02-01), Ohashi
Dainippon Screen Manufacturing Co. Ltd.
Stinson Frankie L.
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