Stage mechanism

Details Stage mechanism Stage mechanism

1989-08-02

1991-11-19

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

2504421, 2504922, G01B 1100

Patent

active

050661310

ABSTRACT:
Disclosed is a stage device suitably usable in a semiconductor microcircuit device manufacturing exposure apparatus for printing a pattern of a mask on a semiconductor wafer, for supporting and positioning the wafer with respect to plurality of directions. The device includes two plate members coupled to each other with a predetermined distance maintained therebetween. Each plate member has formed therein X, Y and .theta. stages defined by plural cutout grooves. Each stage is resiliently supported by a leaf spring functioning portion formed in the plate member. A Z stage for displacing the wafer in the Z direction is mounted to an outer circumferential part of one plate member, and a measuring mirror operable in combination with a laser interferometer is provided as a unit with the Z stage. Any motion of each stage can be controlled on the basis of the measurement made by using this mirror. The structure of the stage device ensures high precision and high rigidity and, therefore, the Z axis can be set substantially horizontally. Consequently the stage device is suitably applicable to an exposure apparatus to be used with an SOR ring.

REFERENCES:
patent: 4676649 (1987-06-01), Phillips
patent: 4749867 (1988-06-01), Matsushita et al.
patent: 4803712 (1989-02-01), Kembo et al.
patent: 4814625 (1989-03-01), Yabu
patent: 4856037 (1989-08-01), Mueller et al.
patent: 4887804 (1989-12-01), Ohtsuka
patent: 4891526 (1990-01-01), Reeds
Folchi et al., "X-ray Lithography Mask Alignment Stage," IBM Technical Disclosure Bulletin; vol. 25, No. 12, May 1983.

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