Method and apparatus for heating a first gas flow with a second

Electric heating – Metal heating – By arc

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

219121P, 219121PQ, 219121PP, 266265, 266270, 432219, 432223, B23K 900

Patent

active

046527257

ABSTRACT:
The invention relates to a method and an apparatus for heating up a first gas-flow with a second gas-flow. The first gas-flow is caused to flow along a wall in a cylindrical chamber as a rotating gas-flow and the second gas-flow is caused to flow centrally in the chamber, surrounded by the first gas-flow, so that the wall is protected.
The apparatus comprises a chamber having an inlet section designed as a whirlpool chamber and an elongate cylindrical mixing part non-radial inlets for the first gas-flow, having their orifices in the wall of the whirlpool chamber and having an inlet for the second gas-flow, arranged substantially centrally in the end of the whirlpool chamber facing away from the mixing part, as well as an outlet section arranged in the mixing chamber part opposite the whirlpool chamber.

REFERENCES:
patent: 2941063 (1960-06-01), Ducati et al.
patent: 3891562 (1975-06-01), Mogensen et al.
patent: 3970290 (1976-07-01), Santen et al.
patent: 3988421 (1976-10-01), Rinaldi
patent: 4072502 (1978-02-01), Santen et al.
patent: 4145403 (1979-03-01), Fey et al.
patent: 4266113 (1981-05-01), Denton et al.
patent: 4370538 (1983-01-01), Browning

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for heating a first gas flow with a second does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for heating a first gas flow with a second , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for heating a first gas flow with a second will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1355375

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.