Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-06-13
1996-02-20
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 43027016, G03F 7023
Patent
active
054927900
ABSTRACT:
A positive photoresist composition applicable for printing and making gas sensors, color filters and the like, without difficulties in process-control for making them, without any deteriorations in the good properties that photoresists originally have, which comprises a compound having at least one group selected from a sulfonamide, carboxylic acid amide and ureido which are substituted at one position, a dissolution inhibitor and an organic solvent and with which a thin color filter having various excellent properties such as color darkness and color reproductivity can be obtained.
REFERENCES:
patent: 5141838 (1992-08-01), Aoshima et al.
patent: 5145763 (1992-09-01), Bassett et al.
patent: 5212042 (1993-05-01), Shinozaki et al.
patent: 5275909 (1994-01-01), Jayaraman et al.
patent: 5340682 (1994-08-01), Pawlowski et al.
Bowers Jr. Charles L.
Sumitomo Chemical Company Limited
Young Christopher G.
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