Culture and transport assembly for percutaneous access device

Surgery – Means for introducing or removing material from body for... – Treating material introduced into or removed from body...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

206438, 435287, A61M 500

Patent

active

049137000

ABSTRACT:
A culture and transport assembly for enclosing a percutaneous access device within a sealed outer container to maintain the device under sterile conditions during transport while accommodating culturing of a coating of dermal cells on a portion of the device while the device is retained within the container. The container has a removable cap to which a culture well body is attached. The percutaneous access device is releasably clamped between the bottom of the body and an underlying platform with a portion of the device projecting into a bore in the body. When the device is so clamped, the bore constituted a sealed culture chamber in which the dermal cell culturing procedure may be performed by introducing cells and culturing solutions into the chamber via fluid passages extending from the chamber to connectors accessible at the exterior of the cap.

REFERENCES:
patent: 4092983 (1978-06-01), Slivenko
patent: 4164221 (1979-08-01), Bentley et al.
patent: 4605007 (1986-08-01), Heraly
patent: 4634422 (1987-01-01), Kantrowitz et al.
patent: 4668222 (1987-05-01), Poirier

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Culture and transport assembly for percutaneous access device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Culture and transport assembly for percutaneous access device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Culture and transport assembly for percutaneous access device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1355125

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.