Method for the controlled delivery of vaporized chemical precurs

Details Method for the controlled delivery of vaporized chemical precurs Method for the controlled delivery of vaporized chemical precurs

1994-02-22

1996-02-20

Owens, Terry J.

Coating processes

Coating by vapor, gas, or smoke

118726, C23C 1602

Patent

active

054927242

ABSTRACT:
Method and apparatus for the controlled delivery of vaporized chemical precursor to a low pressure chemical vapor deposition (LPCVD) reactor. A flow of liquid precursor containing dissolved inert gas is passed through a restrictor element. The dissolved inert gas is released from the liquid precursor at or near the downstream side of the restrictor element. The inert gas is separated from the liquid precursor, thereby producing a continuous flow of liquid precursor, and this flow is fed into an inlet of a-vaporizer. The vaporized precursor is delivered into an LPCVD reactor.

REFERENCES:
patent: 4708884 (1987-11-01), Chandross et al.
patent: 5203925 (1993-04-01), Shibuya et al.
patent: 5232869 (1993-08-01), Frigo et al.
patent: 5314727 (1994-05-01), McCormick et al.
patent: 5316579 (1994-05-01), McMillan et al.

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