Method and apparatus for the reactive vapor deposition of layers

Details Method and apparatus for the reactive vapor deposition of layers Method and apparatus for the reactive vapor deposition of layers

1986-02-28

1986-10-28

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

2041921, 204298, 427 38, C23C 1500

Patent

active

046197486

ABSTRACT:
For the vapor deposition of layers of oxides, nitrides, oxynitrides and carbides by ion plating, the surface to be coated is electrically insulated or mounted under insulation and during the coating an electric plasma is maintained in front of the surface to be coated, in such a way that the ion incidence density on the substrate is 0.5 to 2 mA per cm.sup.2 and the surface charges to a potential of -5 to -60 volts. Thereby especially hard and firmly adhering layers are obtained.

REFERENCES:
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patent: 3974059 (1976-08-01), Murayama
patent: 4112137 (1978-09-01), Zega
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patent: 4226897 (1980-10-01), Coleman
patent: 4399013 (1983-08-01), Sugita et al.
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patent: 4436770 (1984-03-01), Nishizawa
patent: 4448802 (1984-05-01), Buhl et al.
patent: 4559901 (1985-12-01), Morimoto et al.
Matthews et al., Thin Solid Films, 80 (1981) pp. 41-48.

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