Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1993-07-07
1994-10-25
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430269, 430311, 430396, G03F 900
Patent
active
053588070
ABSTRACT:
The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chips and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern, or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.
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Ito et al., "Photo-projection Image Distortion Correction For lu Pattern Process:, in The Tranactions Of The Institute Of Electronics And Communication Engineers", '85/5. vol. J68-c, No. 5 (1985), pp. 225-332, and English translation.
SPIE vol. 470 "Optical Microlithography III: Technology for the Next Decade" (1984), pp. 228-232, Prouty, et al.
Chapman Mark A.
Hitachi , Ltd.
McCamish Marion E.
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