Process for cleaning vinyl chloride polymerization reactors

Details Process for cleaning vinyl chloride polymerization reactors Process for cleaning vinyl chloride polymerization reactors

1975-08-11

1976-12-14

Bashore, S. Leon

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

134 38, 252153, 252364, 252544, B08B 308

Patent

active

039973603

ABSTRACT:
Polymeric deposits formed on internal surfaces of the reactors during polymerization or copolymerization of vinyl chloride are removed by dissolving them at a temperature above 60.degree. C with a solvent mixture comprising from 0 to 7% by weight of water, the remainder consisting of toluene and dimethylformamide in a weight ratio of toluene to dimethylformamide of from 50:50 to 90:10.

REFERENCES:
patent: 3764384 (1973-10-01), Berni
patent: 3784477 (1974-01-01), Esposito
Journal of Polymer Science, "Effects of Solvent Structure in Polyvinyl Chloride-Solvent Systems", vol. 31, 1958, pp. 77, 79, 80, 83-85, 88.

Affiliated with

Also associated with

Rating

Process for cleaning vinyl chloride polymerization reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for cleaning vinyl chloride polymerization reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for cleaning vinyl chloride polymerization reactors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1342929