Phase shift mask, method of correcting the same and apparatus fo

Details Phase shift mask, method of correcting the same and apparatus fo Phase shift mask, method of correcting the same and apparatus fo

1992-03-19

1994-10-25

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

2504922, 156625, 156643, G03F 900

Patent

active

053588061

ABSTRACT:
A defect of a phase shift mask, which has a phase shifter disposed on a transparent substrate, formed into a predetermined pattern and acting to shift a phase of exposure light transmitted therethrough and an etching stopper disposed between the phase shifter and the transparent substrate, which is resistant to an etching to which the phase shifter is subjected and transparent for exposure light is corrected by selectively etching a defective portion of the phase shifter, having a lacking type defect, with respect to the etching stopper layer along the whole thickness of the phase shifter and by perforating a portion of the etching stopper layer and the transparent substrate positioned under the etched defective portion by a depth which corresponds to a magnitude of an optical path of the phase shifter for the exposure light, the etching being a reactive etching which uses charged particle beam and a reactive gas and, the bottom surface of a portion etched being flattened by utilizing a fact that the phase shifter is selectively etched.

REFERENCES:
patent: 4367119 (1983-01-01), Logan et al.
patent: 5045417 (1991-09-01), Okamoto

Affiliated with

Also associated with

Rating

Phase shift mask, method of correcting the same and apparatus fo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phase shift mask, method of correcting the same and apparatus fo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase shift mask, method of correcting the same and apparatus fo will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-134289