Method of preparing an abrasive coated substrate

Details Method of preparing an abrasive coated substrate Method of preparing an abrasive coated substrate

1981-04-20

1982-10-19

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

51209DL, B05D 502, E05D 1510

Patent

active

043550525

ABSTRACT:
An improved method for preparing an abrasive SiO.sub.x coating wherein 1.ltoreq.x.ltoreq.2. The method includes the steps of submitting SiH.sub.4 and N.sub.2 O to glow discharge and depositing the SiO.sub.x product of the glow discharge onto a substrate. The improvement includes the additional step of adjusting the refractive index and thickness of the SiO.sub.x coating by means of the glow discharge deposition process parameters so as to maximize the abrasiveness of the SiO.sub.x coating.

REFERENCES:
patent: 4104832 (1978-08-01), Keizer
patent: 4260647 (1981-04-01), Wang et al.
patent: 4282268 (1981-08-01), Priestley et al.
Joyce et al., "Silicon Oxide and Nitride Films Deposited by an R.F. Glow-Discharge," Thin Solid Films, vol. 1, pp. 481-494, (1967-1968).

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