Process for forming a fluoromethyl ketone

Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...

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554123, 560 23, 560 37, 560 51, 560126, 560169, 560170, 560174, 558230, C07S20716, C07C 6730, C07C32726

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053449398

ABSTRACT:
The preparation of magnesium benzyl fluoromalonate and other equivalent materials, the synthetic equivalents of the --CH.sub.2 F moiety, is described. Reaction between these reagents and the in situ-formed imidazolides of various carboxylic acids gives beta-keto-alpha-fluoroesters, which upon hydrogenation and spontaneous decarboxylation yields fluoromethyl ketones in excellent yields. The overall transformation from RCOOH to RCOCH.sub.2 F is thus illustrated.

REFERENCES:
patent: 4518528 (1985-05-01), Rasnick
S. Rozen et al, Tetrahedron, 41(7), 1111-1153, (1985).
J. Welch, Tetrahedron, 43(14), 3123-3197, (1987).
S. T. Purrington et al, Tetrahedron Letters, 27(24), 2715-2716, (1986).
T. Umemoto et al, Tetrahedron Letters, 27(37), 4465-4468, (1986).
E. Differding, Tetrahedron Letters, 29(47), 6087-6090, (1988).
C. C. Bodurow et al, Tetrahedron Letters, 30(18), 2321-2324, (1989).
S. T. Purrington et al 52 J. Org. Chem., 4307-4310, (1987).
D. W. Brooks et al, Angew. Chem. Int. Ed. Engl., 19(1), 72-74, (1979).
T. S. Mansour, Synthetic Communications, 19(3&4), 659-665, (1989).

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