Projection-exposure apparatus and method exhibiting reduced sola

Details Projection-exposure apparatus and method exhibiting reduced sola Projection-exposure apparatus and method exhibiting reduced sola

1996-12-09

1999-03-09

Braun, Fred L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 70, 355 71, G03B 2742

Patent

active

058808175

ABSTRACT:
Apparatus and methods for suppressing degradations in the transmissivity and refractive index of lenses used in an exposure unit of a projection-exposure apparatus in which a high-energy pulsed beam of light (such as an excimer laser) is used for the projection exposure. Pulsed-light beams from multiple pulsed-light sources are provided, the pulsed-light beams each having the same wavelength, pulse frequency P.sub.0, and fluence F.sub.0 but being phase-shifted relative to each other. The pulsed-light beams are each split by a beam splitter and integrated to produce at least one integrated light beam having a pulse frequency of P.sub.0 times the number of pulsed-light beams that are integrated but a fluence per pulse of F.sub.0 divided by the number of pulsed-light beams that are integrated. The integrated light beam is passed through the exposure unit. Multiple such integrated light beams can be produced, each propagating to a separate exposure unit.

REFERENCES:
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patent: 5091744 (1992-02-01), Omata
patent: 5300971 (1994-04-01), Kudo
patent: 5677754 (1997-10-01), Makinouchi
Rothschild, et al., "Effects of Excimer Laser Irradiation on the Transmission, Index of Refraction, and Density of Ultra-Violet Grade Fused Silica," Appl. Phys. Lett. 55:1276-1278 (1989).

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