Method and apparatus for manufacturing photomask and method of m

Details Method and apparatus for manufacturing photomask and method of m Method and apparatus for manufacturing photomask and method of m

Filed on

1999-04-30

Date issued

2000-03-28

Examiner

Rosasco, S.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Registration or layout process other than color proofing

Other Related Categories

355 53, G03F 900

Type

Patent

Status

active

Patent number

060429771

Description

ABSTRACT:
A method of manufacturing a photomask includes the steps of determining deviation quantities between positions of first and second resist patterns by comparison between the first and second resist patterns, calculating quantities for shifting mask pattern positions based on the deviation quantities between the resist pattern positions, respectively, calculating quantities for shifting drawing fields based on the quantities for shifting the mask pattern positions, respectively, and drawing predetermined mask patterns on a mask substrate in accordance with the quantities for shifting the drawing fields, respectively.

REFERENCES:
patent: 5468580 (1995-11-01), Tanaka
patent: 5773180 (1996-06-01), Tomimatu
patent: 5877845 (1999-03-01), Makinouchi

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