Method of manufacturing an EB mask for electron beam image drawi

Details Method of manufacturing an EB mask for electron beam image drawi Method of manufacturing an EB mask for electron beam image drawi

1998-01-14

2000-03-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

060429712

ABSTRACT:
The present invention consists in a method of creating an EB mask for electron beam image drawing, comprising: a step of extracting patterns for forming on an EB mask from design data stored in means for storage; a step of calculating an aperture area of an aperture section requested in an EB mask, using the design data contained in the extracted cell; a step of generating cell data for aperture creation using the value of this aperture area; and a step of forming a basic aperture pattern in an EB mask using this cell data for aperture creation.

REFERENCES:
patent: 5249197 (1994-09-01), Sakamoto et al.

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