Amidoalane precursors for chemical vapor deposition of aluminum

Organic compounds -- part of the class 532-570 series – Organic compounds – Aluminum containing

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556 27, C07F 506

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058803033

ABSTRACT:
This invention provides volatile, intramolecularly coordinated amido/amine alane complexes, H.sub.2 Al{(R.sup.1)(R.sup.2)NC.sub.2 H.sub.4 NR.sup.3 }, wherein R.sup.1, R.sup.2 and R.sup.3 are each independently H or C.sub.1 -C.sub.3 alkyl. These aluminum complexes show extremely high thermal stability and deposit high-quality aluminum films at low temperatures. They are capable of selectively depositing aluminum films on metallic or other electrically conductive substrates with wide process window.

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