In situ removal of contaminants from the interior surfaces of an

Details In situ removal of contaminants from the interior surfaces of an In situ removal of contaminants from the interior surfaces of an

1995-07-17

1996-09-10

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504922, H01J 3736

Patent

active

055548547

ABSTRACT:
An in situ method of removing contaminant material adhering to interior surfaces of an ion beam implanter is disclosed. The method includes the steps of: extracting ions from source materials and forming the ions into an ion beam that traverses a beam path through an evacuated region to an ion implantation chamber; providing a control means for controlling a trajectory of the ion beam within the evacuated region; utilizing the control means to direct the ion beam to strike interior surfaces of the ion beam implanter in contact with the evacuated region to dislodge the contaminant material; and removing the contaminant material from the evacuated region of the implanter.

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