Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

1997-04-11

1999-11-16

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430396, 355 68, 355 77, 250205, G03F 720, H01L 21027

Patent

active

059854960

ABSTRACT:
An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.

REFERENCES:
patent: 5579147 (1996-11-01), Mori et al.
patent: 5581075 (1996-12-01), Naraki et al.
patent: 5668624 (1997-09-01), Naraki et al.

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