Sulfonium salts and chemically amplified positive resist composi

Details Sulfonium salts and chemically amplified positive resist composi Sulfonium salts and chemically amplified positive resist composi

1996-11-01

1999-03-09

Berman, Susan W.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522 31, 522 15, 522160, 4302701, G03F 7039, G03F 7038, G03F 7004

Patent

active

058801693

ABSTRACT:
The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a normal, branched or cyclic C.sub.1 -C.sub.20 alkylsulfonate anion. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates an alkylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.

REFERENCES:
patent: 4451409 (1984-05-01), Buske et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 5310619 (1994-05-01), Crivello et al.
patent: 5328973 (1994-07-01), Roeschert et al.
patent: 5525453 (1996-06-01), Przybilla et al.
patent: 5550004 (1996-08-01), Honda
patent: 5558976 (1996-09-01), Urano et al.
patent: 5569784 (1996-10-01), Watanabe et al.
patent: 5585220 (1996-12-01), Breyta et al.
patent: 5612170 (1997-03-01), Takemura et al.
patent: 5654121 (1997-08-01), Eichhorn et al.

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