Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1996-09-17
1999-11-16
Straub, Gary P.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423335, 106490, C01B 1514, C01B 3312, C04B 1404
Patent
active
059852291
ABSTRACT:
A solid silica derivative which is represented by the general formula H.sub.n SiO.sub.(4-n)/2 wherein n is a real number larger than 0 but smaller than 2 and which contains Si--H bond, said solid silica derivative being able to be easily produced in a high yield by subjecting to hydrolysis-condensation an alkoxysilane represented by the mean general formula H.sub.n --Si(OR.sup.0).sub.4-n in which R.sup.0 represents an alkyl group having 1 to 4 carbon atoms, plural R.sup.0 groups may be the same as or different from one another and n is a real number greater than 0 but smaller than 2, using water in an amount of (4-n)/2 moles or more per mole of the alkoxysilane at a pH of 10.5 or less.
REFERENCES:
patent: 2832794 (1958-10-01), Gordon
patent: 2844435 (1958-07-01), Wagner
patent: 2901460 (1959-08-01), Boldebuck
patent: 3615272 (1971-10-01), Collins
patent: 4016188 (1977-04-01), Kotzsch et al.
patent: 4999397 (1991-03-01), Weiss et al.
patent: 5010159 (1991-04-01), Bank et al.
patent: 5063267 (1991-11-01), Hanneman et al.
patent: 5091162 (1992-02-01), Frye et al.
patent: 5106604 (1992-04-01), Agaskar
Harada Katsuyoshi
Yamada Yoshinori
Straub Gary P.
Toagosei Co. Ltd.
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