Method for forming a filter

Details Method for forming a filter Method for forming a filter

1997-10-15

1999-11-16

Drodge, Joseph W.

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

210490, 21050026, 216 56, 422101, B32B 3100, C19K 1300, B01D 7104

Patent

active

059851643

ABSTRACT:
Surface micromachining and bulk micromachining are employed for realizing a porous membrane with bulk support for a microparticle filter. The filter is manufactured by a process employing a thin film etch-stop, in which the bulk substrate is etched using a first etching process followed by etching of the etch stop and of material within pores of a filter layer using a second etching process. The filter is sufficiently sturdy to allow for easy handling. It may be used as a diffusion barrier and under high pressures. The disclosed fabrication method is simple, reliable, and integrated-circuit compatible, and thus amenable to mass production. Electronic circuitry may be integrated on the filter surface, as may be desired for several purposes, such as fluid characterization, filter self-cleaning, or charging of the filter surfaces. Methods are shown for the realization of biological containment capsules based on this microfilter.

REFERENCES:
patent: 2226381 (1940-12-01), Norris
patent: 2226383 (1940-12-01), Norris
patent: 2246380 (1941-06-01), Norris
patent: 3502455 (1970-03-01), Gardner
patent: 3556945 (1971-01-01), Messing
patent: 3600147 (1971-08-01), McKinnis et al.
patent: 3791987 (1974-02-01), Fanger
patent: 3841971 (1974-10-01), Messing
patent: 3845770 (1974-11-01), Theeuwes et al.
patent: 3936329 (1976-02-01), Kendall et al.
patent: 3962052 (1976-06-01), Abbas et al.
patent: 4063271 (1977-12-01), Bean et al.
patent: 4077885 (1978-03-01), Van Heuven et al.
patent: 4078971 (1978-03-01), Arkles et al.
patent: 4177228 (1979-12-01), Prolss
patent: 4217898 (1980-08-01), Theeuwes
patent: 4307507 (1981-12-01), Gray et al.
patent: 4369565 (1983-01-01), Muramatsu
patent: 4409331 (1983-10-01), Lim
patent: 4455143 (1984-06-01), Theeuwes et al.
patent: 4473476 (1984-09-01), McMillan et al.
patent: 4673566 (1987-06-01), Goosen et al.
patent: 4689150 (1987-08-01), Abe et al.
patent: 4698900 (1987-10-01), Esquivel
patent: 4743545 (1988-05-01), Torobin
patent: 4793825 (1988-12-01), Benjamin et al.
patent: 4797175 (1989-01-01), Ellion et al.
patent: 4797211 (1989-01-01), Ehrfeld et al.
patent: 4814083 (1989-03-01), Ford et al.
patent: 4851228 (1989-07-01), Zentner et al.
patent: 4853001 (1989-08-01), Hammel
patent: 4874484 (1989-10-01), Foell et al.
patent: 4937209 (1990-06-01), Jones et al.
patent: 4981590 (1991-01-01), Van 'T Veen et al.
patent: 5126810 (1992-06-01), Gotou
patent: 5131978 (1992-07-01), O'Neill
patent: 5156623 (1992-10-01), Hakamatsuka et al.
patent: 5160617 (1992-11-01), Huis Int'l Veld et al.
patent: 5183607 (1993-02-01), Beall et al.
patent: 5200334 (1993-04-01), Dunn et al.
patent: 5225123 (1993-07-01), Torobin
patent: 5230693 (1993-07-01), Williams et al.
patent: 5234594 (1993-08-01), Tonucci et al.
patent: 5238613 (1993-08-01), Anderson
patent: 5262021 (1993-11-01), Lehman et al.
patent: 5271801 (1993-12-01), Valette
patent: 5275766 (1994-01-01), Gadkaree et al.
patent: 5304487 (1994-04-01), Wilding et al.
patent: 5314471 (1994-05-01), Brauker et al.
patent: 5376347 (1994-12-01), Ipponmatsu et al.
patent: 5431921 (1995-07-01), Thombre
patent: 5453278 (1995-09-01), Chan et al.
patent: 5543046 (1996-08-01), Van Rijn
patent: 5585011 (1996-12-01), Saaski et al.
patent: 5603953 (1997-02-01), Herbig et al.
G. Kittilsland et al., "A Sub-Micron Particle Filter in Silicon," Sensors and Actuators, A21-A23, (1990), pp. 904-907.
W. Lang et al., "Application of Porous Silicon as a Sacrificial Layer," 7th International Conference on Solid-State Sensors and Actuators Digest of Technical Papers, Jun. 7-10, 1993, pp. 202-205.
Websters Third New International Dictionary, Copyright 1986 by Merriam-Webster, Inc., p. 811.

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