Semiconductor manufacturing apparatus

Details Semiconductor manufacturing apparatus Semiconductor manufacturing apparatus

1996-05-14

1999-11-16

Breneman, Bruce

Coating apparatus

With indicating, testing, inspecting, or measuring means

118713, 156345, 20429803, 20429832, C23C 1600

Patent

active

059850329

ABSTRACT:
In the process of dry etching or the like, the bond between specific atoms contained in a deposit attached on the interior wall of a chamber and composed of an etching by-product is monitored by using an infrared ray. An incoming infrared ray generated from a light source for monitoring is directed to the deposit so that the absorption spectrum of an outgoing infrared ray passing through the deposit is measured by an infrared-ray measuring device. As a result, accurate information on the inside of the chamber can be obtained and a reduction in production yield due to variations in etching characteristics and generated particles can be prevented. Moreover, the availability of an apparatus can be increased by optimizing a maintenance cycle based on a specific variation in the absorption spectrum of the infrared ray. In particular, process administration and process control in such processing using plasma as dry etching and plasma CVD can be improved.

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patent: 5782974 (1998-07-01), Sorensen et al.
patent: 5843232 (1998-12-01), Savkar et al.

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