Photoresist supplying system for used in a semiconductor fabrica

Details Photoresist supplying system for used in a semiconductor fabrica Photoresist supplying system for used in a semiconductor fabrica

1997-05-02

1999-03-09

Shaver, Kevin P.

Dispensing

With filter

222394, B67D 508

Patent

active

058789189

ABSTRACT:
A photoresist supplying system for used in a semiconductor fabrication, the system includes a photoresist holder for storing photoresist. A first gas supplier is connected to the photoresist holder for providing gas to the photoresist holder to force the photoresist out of the photoresist holder. A buffer is connected to the photoresist holder via an input terminal to exhaust the gas, the photoresist is output by an output terminal of the buffer. A first valve is connected to the output terminal of the buffer for controlling the flowing rate of the photoresist. A second valve is connected to the buffer to drain the gas collected by the space. A pumping apparatus is connected to the first valve via an input terminal to suck the photoresist. A filter is connected to the pumping apparatus to filter out the impurity in the photoresist. A vibrator is set in the photoresist supplying system to hold the filter for eliminating bubble. A suckback apparatus is connected to the filter to suck back over quantity photoresist before the photoresist is sprayed on a wafer.

REFERENCES:
patent: 5148945 (1992-09-01), Geatz
patent: 5316181 (1994-05-01), Burch
patent: 5330072 (1994-07-01), Ferri, Jr. et al.
patent: 5370269 (1994-12-01), Bernosky et al.
patent: 5383574 (1995-01-01), Raphael
patent: 5636762 (1997-06-01), Juhola et al.

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