Semiconductor device

Details Semiconductor device Semiconductor device

1991-03-01

1992-10-13

Epps, Georgia Y.

357 238, 357 234, H01L 2940

Patent

active

051555743

ABSTRACT:
A discrete array (30) of p-type regions (31) surrounding channel regions of n-channel MOSFET cells is provided in a drain region of the MOSFET cells. The p-type regions have depth corresponding to the depth of p-type areas (5) defining the channels. A depletion layer (F1) which is generated and extends from the channel regions through application of a voltage is stretched by the p-type regions, so that the electric field in the depletion layer is weakened. As a result, anti-breakdown ability of the MOSFET cells is improved. The discrete arrangement of the p-type regions is required in order to obtain current path between the channels and n-type drain regions (4).

REFERENCES:
patent: 4574209 (1986-03-01), Lade et al.
patent: 4901127 (1990-02-01), Chow et al.

Affiliated with

Also associated with

Rating

Semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1305166