Method of diffusing silicon slices with dopant at high temperatu

Details Method of diffusing silicon slices with dopant at high temperatu Method of diffusing silicon slices with dopant at high temperatu

1975-02-10

1976-05-11

Ozaki, G.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

148190, H01L 734

Patent

active

039560368

ABSTRACT:
A method of applying a boron dopant to silicon slices which comprises applying a dopant solution to the faces of each slice, packing a plurality of slices adjoining each other in a quartz boat and inserting the boat slowly into a tubular furnace. The boron surface of each slice is covered with alumina powder to eliminate sticking. After heating at 1350.degree. Celsius for four hours the slices are slowly pulled out of furnace.

REFERENCES:
patent: 2804405 (1957-08-01), Derick et al.
patent: 3183130 (1965-05-01), Reynolds et al.
patent: 3615944 (1971-10-01), Sheng et al.

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