Method and apparatus for removing components bonded to a substra

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156229, 156584, 228264, B32B 3100

Patent

active

051547937

ABSTRACT:
A method of removing components bonded to a substrate without damaging either the component-to-be-removed or adjacent components involves bonding a lifting member to an exposed surface of a component-to-be-removed with a bonding layer whose yielding temperature is above the yielding temperature of the bonding layer which bonds the component-to-be-removed to the substrate and then pulling the lifting member under conditions which cause the bond between the component and the substrate to yield. This component removal process enables post removal failure analysis to be performed on a faulty component and also allows a removed good component to be reused by preventing damage to the component being removed.

REFERENCES:
patent: 3094323 (1963-06-01), Catania
patent: 3279969 (1966-10-01), Borchardt
patent: 4004061 (1977-01-01), Creighton et al.
patent: 4398985 (1983-08-01), Eagon
patent: 4436242 (1984-03-01), Shisler et al.
patent: 4517235 (1985-05-01), Ungar et al.
patent: 4664739 (1987-05-01), Aurichio
patent: 4759816 (1988-07-01), Kasper et al.
patent: 4775438 (1988-10-01), Funakoshi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for removing components bonded to a substra does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for removing components bonded to a substra, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for removing components bonded to a substra will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1298200

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.