Resinous salts, their preparations, and their use in coatings

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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428460, 525523, 528107, 528109, 528158, C08G 5906, C08G 5914, C08G 5916

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active

044106750

ABSTRACT:
Resinous salts, prepared by thioalkylation or sulfoalkylation of a phenol obtained by advancement of a polyepoxide, followed by at least partial neutralization, have the general formula ##STR1## where R.sup.- represents a group of formula --S--R.sup.1 --COO.sup.- or a group of formula --SO.sub.3.sup.- ; R.sup.1 represents an aliphatic, aromatic or araliphatic divalent group which may contain a further group --COO.sup.- M.sup.+ ; R.sup.2 represents --H or alkyl; one of R.sup.3 and R.sub.1.sup.3 represents a hydroxyl group and the other represents --H, halogen, alkyl, or alkenyl; each R.sup.4 represents --H, halogen, alkyl, or alkenyl; R.sup.5 represents --H, halogen, alkyl, alkenyl, or a group --CH(R.sup.2)OH, --CH(R.sup.2)OR.sup.8, or --CHR.sup.2 --R.sup.- M.sup.+ ; R.sup.6 represents the residue of a polyepoxide, preferably of average mol. wt. 1000-5000; each of the groups R.sup.7, which may be the same or different, represents --H or a covalent bond linked to the group R.sup.6 ; R.sup.8 represents alkyl or alkoxyalkyl; R.sup.9 denotes the residue of an optional terminating group; m represents 1, 2, 3, or 4; n and p represent zero or 1, X represents alkylene, carbonyl, sulfonyl, oxygen, sulfur, or a valence bond; and M.sup.+ represents a hydrogen ion or a cation derived from an alkali metal, ammonia, an amine or one valence of a polyvalent cation, at least 25% of the ions being a said cation.
Composition comprising these salts and, if required, a phenoplast, an aminoplast, or a blocked polyisocyanate, are stable when dispersed in water, usually with the aid of a minor amount of an organic solvent, and may be used to form protective films, especially for metal containers.

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J. Org. Chem. 1945, 10, 470-478, Suter et al.

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