Scanning wedge method for determining characteristics of a photo

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G03B 4100

Patent

active

046182330

ABSTRACT:
A method and a system for determining the characteristics of a photoresist are disclosed. This scanning wedge method is accomplished by linearly varying the exposure dose the photoresist receives. Thereafter, the photoresist is developed. The location of interference fringes on the developed photoresist is then determined. This provides the data necessary to determine the characteristics of the photoresist.

REFERENCES:
patent: 3631772 (1972-01-01), Curran

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