Optics: measuring and testing – Standard
Patent
1990-10-15
1993-03-30
Rosenberger, Richard A.
Optics: measuring and testing
Standard
G01N 2188
Patent
active
051988690
ABSTRACT:
A standard for calibrating a wafer surface inspection optical scanner, particularly a system for measuring haze. The referene wafer contains sections divided into subsections, each subsection having a quasi-random pattern of light scattering features on an otherwise polished surface of the wafer. The quasi-random pattern of features is formed by creating a random pattern of pits within tiny areas of the subsection and repeating that pattern. The random pattern of pits covers an area less than the area of the spot of a scanning beam used by the wafer surface inspection system. By randomizing the pattern of pits within the scanning beam, the scattered light does not produce interference patterns and thus the scattered light is more isotropic. A direct measurement of the amount of hazel on the reference wafer can be obtained from measuring the amount of scattered light caused by the pits. Since this level of scattering is known beforehand to correspond to a certain level of haze, the wafer surface inspection system can then be calibrated to accurately measure haze on surfaces of non-reference wafers.
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Monteverde Robert J.
Scheer Bradley W.
Rosenberger Richard A.
VLSI Standards, Inc.
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