Lithographic apparatus for the production of microstructures

Details Lithographic apparatus for the production of microstructures Lithographic apparatus for the production of microstructures

1986-01-30

1988-02-09

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250398, H01J 3700

Patent

active

047243287

ABSTRACT:
Lithographic apparatus for producing microstructures which comprises a particle beam source 1 and a condenser lens system 2, 3 and a controllable aperture diaphragm 4 having line-shaped multi-hole structures 17 . . . 22 for generating a plurality of particle beam fingers. A blanking diaphragm and an imaging optic structure 6, 7 OL are also provided. The invention produces a higher output of exposed structures than the prior art and for this purpose the particle beams are combined to form a ribbon beam which has the greatest cross-sectional dimension 12, 13 approximately in the longitudinal direction 23 of the line-shaped multi-hole structure 17 . . . 22 and which has the smallest cross-sectional dimension which does not significantly exceed the width of the multi-hole structure. The multiple beams are utilized in lithographic apparatus for generating semiconductor circuits in the submicrometer region on a GaAs base and for generating components for optical communications technology.

REFERENCES:
patent: 4130761 (1978-12-01), Matsuda
patent: 4153843 (1979-05-01), Pease
patent: 4200794 (1980-04-01), Newberry
patent: 4409487 (1983-10-01), Kuschel et al.
patent: 4430570 (1984-02-01), Takigawa
patent: 4472636 (1984-09-01), Hahn
patent: 4498952 (1985-02-01), Christensen
patent: 4633090 (1986-12-01), Hahn
IEEE Transactions on Electron Devices, vol. ED-26, No. 4, Apr. 1979, Recent Advances in Electron-Beam Lithography for the High Volume Production VLSI Devices, pp. 663-674.
Design and Testing of a Corrected Projection Lens System for Electron-Beam Lithography appearing in Siemens Forsch.-U. Entwickl.-Ber.Bd. 9 (1980) No. 3.

Affiliated with

Also associated with

Rating

Lithographic apparatus for the production of microstructures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus for the production of microstructures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus for the production of microstructures will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1284684