Phase shift mask and phase shift mask blank

Details Phase shift mask and phase shift mask blank Phase shift mask and phase shift mask blank

1996-11-06

1998-09-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428432, G03F 900

Patent

active

058043373

ABSTRACT:
A phase shift mask comprises a transparent substrate (1) provided with a mask pattern formed by a light transmitting portion (4) for transmitting effective light beams having an intensity which substantially contributes to exposure and a light translucent portion (2) for transmitting ineffective light beams having an intensity which does not substantially contribute to exposure. The light translucent portion (2) is for phase shifting the ineffective light beams transmitted therethrough to make the ineffective light beams be different in phase from the effective light beams transmitted through the light transmitting portion (4) that the effective and the ineffective light beams passing through an area in the vicinity of a boundary between the light transmitting portion (4) and the light translucent portion (2) cancel each other so as to assure an excellent contrast at the boundary. The light translucent portion (2) comprises a thin film made of a material containing oxygen, metal, and silicon as main components.

REFERENCES:
patent: 5409789 (1995-04-01), Ito
patent: 5422205 (1995-06-01), Inoue et al.
patent: 5429897 (1995-07-01), Yoshioka et al.
patent: 5464713 (1995-11-01), Yoshioka et al.
patent: 5605776 (1997-02-01), Isao et al.
patent: 5629114 (1997-05-01), Isao et al.
patent: 5631109 (1997-05-01), Ito

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